Circuit, device and process simulation / Graham F. Carey (c1996)

Public ISBD Titre : Circuit, device and process simulation : mathematical and numerical aspets Type de document : texte imprime Auteurs : Graham F. Carey ; Richardson Reed Coke S. Editeur : New York : John Wiley& Son Année de publication : c1996 Importance : XIII- 425 p., [1] leaf of plates Présentation : ill. (some col.) Format : 24 cm ISBN/ISSN/EAN : 978-0-471-96019-5 Note générale : Includes bibliographical references (p. 390-421) and index. Langues : Anglais Mots-clés : Electronic circuit design:data processing  Computer-aided design  Semiconductors:mathematical models:data processing  Numerical analysis:data processing Index. décimale : 621.395 Résumé : This book presents for the first time a unified treatment of the physical processes, mathematical models and numerical techniques for circuit, device and process simulation. At the macroscopic level linear and nonlinear circuit elements are introduced to yield a mathematical model of an integrated circuit. Numerical techniques used to solve this coupled system of ODEs are described. Microscopically, current flow within a transistor is modeled using the drift–diffusion and hydrodynamic PDE systems. Finite difference and finite element methods for spatial discretizations are treated, as are grid generation and refinement, upwinding, and multilevel schemes. At the fabrication level, physical processes such as diffusion, oxidation, and crystal growth are modeled using reaction–diffusion–convection equations. These models require multistep integration techniques and Krylov projection methods for successful implementation. Exercises, programming assignments, and an extensive bibliography are included to reinforce and extend the treatment. Permalink : ./index.php?lvl=notice_display&id=10864 Circuit, device and process simulation : mathematical and numerical aspets [texte imprime] / Graham F. Carey ; Richardson Reed Coke S. . - New York : John Wiley& Son, c1996 . - XIII- 425 p., [1] leaf of plates : ill. (some col.) ; 24 cm. ISBN : 978-0-471-96019-5 Includes bibliographical references (p. 390-421) and index. Langues : Anglais Mots-clés : Electronic circuit design:data processing  Computer-aided design  Semiconductors:mathematical models:data processing  Numerical analysis:data processing Index. décimale : 621.395 Résumé : This book presents for the first time a unified treatment of the physical processes, mathematical models and numerical techniques for circuit, device and process simulation. At the macroscopic level linear and nonlinear circuit elements are introduced to yield a mathematical model of an integrated circuit. Numerical techniques used to solve this coupled system of ODEs are described. Microscopically, current flow within a transistor is modeled using the drift–diffusion and hydrodynamic PDE systems. Finite difference and finite element methods for spatial discretizations are treated, as are grid generation and refinement, upwinding, and multilevel schemes. At the fabrication level, physical processes such as diffusion, oxidation, and crystal growth are modeled using reaction–diffusion–convection equations. These models require multistep integration techniques and Krylov projection methods for successful implementation. Exercises, programming assignments, and an extensive bibliography are included to reinforce and extend the treatment. Permalink : ./index.php?lvl=notice_display&id=10864

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